Plasma Chemistry And Plasma Processing

Plasma Chemistry And Plasma Processing英文簡介

Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.

Plasma Chemistry And Plasma Processing中文簡介

《Plasma Chemistry And Plasma Processing》是一本由SPRINGER出版商出版的專業工程技術期刊，該刊創刊于1981年，刊期Quarterly，該刊已被國際權威數據庫SCIE、SCI收錄。在中科院最新升級版分區表中，該刊分區信息為大類學科：工程技術 3區，小類學科：工程：化工 3區；物理：應用 3區；物理：流體與等離子體 3區；在JCR（Journal Citation Reports）分區等級為Q2。該刊發文范圍涵蓋工程：化工等領域，旨在及時、準確、全面地報道國內外工程：化工工作者在該領域取得的最新研究成果、工作進展及學術動態、技術革新等，促進學術交流，鼓勵學術創新。2021年影響因子為3.337，平均審稿速度較慢,6-12周。

中科院分區最新升級版（當前數據版本：2021年12月最新升級版）

大類學科	分區	小類學科	分區	Top期刊	綜述期刊
工程技術	3區	ENGINEERING, CHEMICAL 工程：化工 PHYSICS, APPLIED 物理：應用 PHYSICS, FLUIDS & PLASMAS 物理：流體與等離子體	3區 3區 3區	否	否

JCR分區（當前數據版本：2021-2022年最新版）

JCR分區等級	JCR所屬學科	分區	影響因子
Q2	PHYSICS, FLUIDS & PLASMAS	Q2	3.337
	PHYSICS, APPLIED	Q2
	ENGINEERING, CHEMICAL	Q2

期刊指數

影響因子	h-index	Gold OA文章占比	研究類文章占比	OA開放訪問	平均審稿速度
3.337	57	7.53%	93.24%	未開放	較慢,6-12周

IF值(影響因子)趨勢圖